Sponsoring Divisions:
Division 7, Physical Electrochemistry
Division 4, Electrochemical Materials Science

The influence of surfactants on the morphology and structure of materials produced by either physical or chemical means is of central importance to several evolving technologies ranging from nanoparticle synthesis by redox reactions to electroplating thin functional films. This symposium seeks to bring together researchers interested in exploring the synergies between adsorbate effects observed during particle and thin film growth by electrolytic, chemical reduction, CVD or PVD methods. In the last decade significant capabilities for investigating the potential dependent structure and dynamics of adsorbates on single crystal surface have been established. Likewise, the impact of adsorbed anions, cations and /or molecules on the production of metal and semiconductor films and particles has been widely reported. Taking advantage of this diverse background we would like to explore several questions of common interest such as:
- What is the correlation between adsorbate structure and particle shape or facet geometry?
- What is the extent of rate differentiation accessible by using different surfactants?
- How much anisotropy can be induced in the electrocrystallization reaction by using different adsorbates?
- How do potential perturbations affect the adsorbate structure and consequently impact the film growth dynamics?
- How is particle growth influenced by the choice of reducing agent and surfactant(s), and how does this compare to electrolytic growth at comparable potentials?
- How is roughness evolution influenced by surfactants?
- How effectively do surfactants remain segregated at growing interfaces?
- Why do some surfactants or additives lead to the breakdown of epitaxial growth and become incorporated in the growing solid?
- How do surfactants influence the deposition of alloys and compounds?
New experimental and theoretical approaches for studying surfactant and additive effects are of interest. Similarly welcome are approaches of simulation of the effects of surfactants additives.

Symposium organizers
Tom Moffat
NIST, USA, Thomas.moffat@nist.gov
Ian Burgess
University of Saskatchewan, Canada, ian.burgess@usask.ca
Waldfried Plieth
Technische Universität Dresden, Germany,
Waldfried.plieth@chemie.tu-dresden.de
Younan Xia
University of Washington, USA, xia@chem.washington.edu